Researchers at Chinese Academy of Sciences , Jilin University , State Key Laboratory of Advanced Manufacturing for Optical Systems , and University of Chinese Academy of Sciences published a technical paper titled “Evaluating an alternative Pt-W alloy as a low-n EUV mask absorber: Film properties and imaging performance.” “ In this study, we investigate an alternative Pt-W alloy as a next-generation low-n EUV mask absorber,” states the paper. Find the technical paper here . August 2026. Li, Zhonghua, Haolong Tang, Xiaoyi Wang, Hongwei Tian, Yanchao Wang, and Hanwen Hu. “Evaluating an alternative Pt-W alloy as a low-n EUV mask absorber: Film properties and imaging performance.” iScience, August 2026. https://doi.org/10.1016/j.isci.2026.116912. Attribution- NonCommercial 4.0 International. The post Pt-W Alloy Shows Potential For Thinner High-NA EUV Mask Absorbers (Chinese Academy of Sciences et al.) appeared first on Semiconductor Engineering .