Researchers at KU Leuven , Kunsan National University , Vrije Universiteit Brussel , imec, et al. published “Irradiation-Source-Dependent Tone Conversion in Dry-Deposited Halogenated Amorphous Zeolitic Imidazolate Framework Resists for Electron-Beam and Extreme Ultraviolet Lithography.” Abstract Excerpt: “Dry-deposited metal–organic resists are key enablers for advanced patterning processes in next-generation semiconductor manufacturing. Here, we report halogenated amorphous zeolitic imidazolate framework (a-ZIF) resists deposited entirely by a dry process, which exhibit a pronounced irradiation-source-dependent tone conversion.” Find the technical paper here . October 2026. Byeon, Jinhwan, Nick Gys, Jorid Smets, Ali Azimi, Lukas Nulens, João Fernandes, Leen Boullart et al. “Irradiation-Source-Dependent Tone Conversion in Dry-Deposited Halogenated Amorphous Zeolitic Imidazolate Framework Resists for Electron-Beam and Extreme Ultraviolet Lithography.” ACS Applied Materials & Interfaces (2026). The post Dry-Deposited Resist Shows Different Tone Behavior Under EUV And E-Beam Exposure (KU Leuven, Kunsan, VUB, Imec) appeared first on Semiconductor Engineering .